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Beilstein J. Nanotechnol. 2021, 12, 24–34, doi:10.3762/bjnano.12.2
Figure 1: AFM topography image (10 µm × 10 µm) of an FTO substrate (left) and of an FTO substrate coated with...
Figure 2: CVs of 0.5 mM K3[Fe(CN)6] and 0.5 mM K4[Fe(CN)6] in 0.5 M KCl on FTO electrodes covered with Al2O3 ...
Figure 3: CVs of 0.5 mM K3[Fe(CN)6] and 0.5 mM K4[Fe(CN)6] in 0.5 M KCl demonstrating the blocking properties...
Figure 4: CVs of 0.5 mM K3[Fe(CN)6] and 0.5 mM K4[Fe(CN)6] in 0.5 M KCl demonstrating the blocking properties...
Figure 5: Si wafer coated with an Al2O3 film (17 nm) after exposure to 1 M NaOH for 1h. (a) Optical microscop...
Figure 6: CVs of 0.5 mM K3[Fe(CN)6] and 0.5 mM K4[Fe(CN)6] in 0.5 M KCl demonstrating blocking properties of ...
Figure 7: CVs in the presence of 0.5 mM K3[Fe(CN)6] and 0.5 mM K4[Fe(CN)6] in 0.5 M KCl. Blocking properties ...
Figure 8: Chronoamperometry in buffered solution (pH 7.2). Comparison of bare FTO (blue) and FTO covered with...
Figure 9: XRD patterns of samples polarized at −1.2 V vs Ag/AgCl in buffer (pH 7.2) for 5 h. Red trace: FTO, ...